SFF-8643 cable is a type of data transfer cable that uses the Small Form Factor (SFF) 8643 connector. This cable is commonly associated with high-speed data connectivity by connecting SAS drives to RAID controllers or storage enclosures in storage and server environments.
Besides, sff 8643 cable has lots of advantages like: High Data Transfer Rates,Compact Form Factor,High-Density Connectivity,Versatility with SAS and SATA Devices,Internal Connectivity in Storage Systems,Organized Cable Management,Support for RAID Configurations and Reliability in Internal Connectivity.
Applications
Data Centers
SANs and HPC
RAID Configurations
Server Configurations
Virtualized Environments
Enterprise Backup Systems
Enterprise Storage Solutions
Testing and Measurement Systems
Media Production and Broadcasting
Sff-8643 cable,sff 8639 sff 8643,sff 8643 u 2,mini sas hd sff 8643,sff 8643 sas Dongguan Aiqun Industrial Co.,Ltd , https://www.gdoikwan.com
GT plans to commercialize plasma vapor deposition tools to match its ongoing hydride vapor phase epitaxy (HVPE) system, which will enable LED manufacturers to produce at lower cost on patterned or planar wafers. Higher yields of gallium nitride templates.
GT already has a prototype tool that can be used for mass production, combined with Kyma's plasma vapor deposition columnar nanotechnology, which is expected to be available in the first half of 2015.
Tom Gutierrez, President and CEO of GTAT, said: "Kyma's innovative "columnar nano" PVDNC technology provides an important complement to our expanding LED production base. Our goal is to provide a range of solutions to enhance LEDs. Production quality and cost reduction. Combining GT's PVD AlN tool with the HVPE system we are developing is expected to enable LED manufacturers to produce out-of-the-box wafers at a lower cost than current production technologies."
Kyma's President and CEO Keith Evans said: "We are very pleased that GT has decided to commercialize our plasma vapor deposition columnar nanotechnology. After years of innovation and production of AIN templates, we are convinced that columnar nano-AlN films will be LED industry. Bring tangible benefits."
At present, when depositing gallium nitride on a wafer ready to use, it is necessary to use a relatively expensive and slow process MOCVD tool. By combining the two processes of PVD and HVPE, it will be possible to produce low-cost GaN template, manufacturers will be able to expand production with existing LED production lines; in addition, because they need fewer MOCVD tools, this can also be reduced Its capital expenditure. 
GT Advanced Technologies (GTAT) announced that it has acquired exclusive access to its Plasma Vapor Deposition (PVD) technology and expertise from Kyma Technologies, Inc. Kyma's plasma vapor deposition columnar nanotechnology (PVDNC(TM)) deposits a high quality growth-type initial layer of aluminum nitride on the wafer prior to precipitation of gallium nitride.